Physikalisches Kolloquium

Atomic Layer Processing of Nanostructured Functional Materials: Role of Precursors

Prof. Dr. Anjana Devi

IFW Dresden, TU Dresden und IMS Duisburg

Abstract:

Atomic layer processing (ALP) of functional materials is governed strongly by the precursors employed. With the growing demand for new materials and their selective growth on surfaces or on demanding geometries with a precise control of material properties, there are stringent conditions laid down on precursor characteristics. In this context, new or modified precursors with enhanced physico-chemical properties are sought after. The strategy to employ appropriately tailored ligand systems with a trade-off between reactivity, thermal stability and reactivity of the resulting precursors and the choice of co-reactants can make more inroads in the field of ALP of new functional materials. In this presentation, representative cases of transition metal and coinage metal precursors will be discussed that includes precursor features and their application towards ALP.