S. Shams, S. Shah, I. Ratschinski, D. Hiller, "Influence of Al-precursor and oxidant on the performance of ALD-Al2O3 ultra-thin films embedded in SiO2 for modulation acceptor doping of silicon", Appl. Phys. Lett. 129, 132109 (2026); DOI: 10.1063/5.0356163
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