Wet chemical processes play a major role in the production of microelectronic components. This primarily concerns etching and cleaning processes. The chemicals used must meet high purity requirements. Rinsing processes are carried out with deionised water. The central cleanroom laboratory has a special water treatment system for this purpose.
Acid cleaning
The acid cleaning wet chemistry bench for all work with acids has various tanks in which standard processes can be carried out. These include Caro's acid, HF dip, buffered HF, polyacid (for etching SiO2) and SC-1. Heatable overflow rinsers and rinsers with conductivity measurement are available for rinsing with ultrapure water. Individual processes with any chemicals can also be carried out in two large rinsing tanks. A heatable ultrasonic cleaning tank is also available.
Alkaline cleaning
The wet chemical bench for basic cleaning has tanks in which the standard processes TMAH and SC-2 can be carried out. An overflow rinser with conductivity measurement is available for rinsing with ultrapure water. Individual processes with any chemicals can also be carried out in two large rinsing tanks. A heatable ultrasonic cleaning tank is also available.