The Institute of Applied Physics (IAP) at TU Bergakademie Freiberg focuses on the deposition and characterisation of thin-film dielectrics and the embedding of nanocrystalline semiconductors in dielectric layers.

The Institute is particularly interested in the characterisation of defects and the passivation properties of such layers in combination with electronic, optoelectronic and photovoltaic components. The Institute of Applied Physics has full access to a very well-equipped cleanroom laboratory for the deposition and characterisation of semiconductor materials, an electrical and optical laboratory.